Glass composition for crystallized glass

ABSTRACT

A polished glass disk medium substrate suitable for use as a substrate for a hard disk, a hard disk containing the substrate and methods for making the substrate. The substrate containing glass forming raw materials may be formed so as to have a Young&#39;s modulus of 110 or higher.

RELATED APPLICATION

This application claims priority to Japanese Patent Application No.2000-100818 filed in Japan on Apr. 3, 2000, the contents of which arehereby incorporated by reference.

FIELD OF THE INVENTION

The present invention relates to a glass composition, and specificallyrelates to a glass composition suited for crystallized glass. Morespecifically, the present invention relates to a composition forcrystallized glass disk medium. Such disk medium include hard disks,magnetic disks, optical disks and magnetic-optical disks

DESCRIPTION OF THE PRIOR ART

Aluminum and glass are known materials suitable for use as magnetic disksubstrates. Among these substrates, glass substrates have been the focusof most attention due to their superior surface smoothness andmechanical strength. Such glass substrates include chemically reinforcedglass substrates strengthened by ion exchange on the surface, andcrystallized glass substrates having strengthened bonds by depositing acrystal component on the substrate.

The performance demands of recent substrates have become more severe dayby day, and improved performance is particularly sought regardingstrength, flex and warp during high-speed rotation. This type ofperformance can be expressed by the Young's modulus of the substratematerial, in which a higher numerical value is desirable.

For example, the composition disclosed in Japanese Laid-Open PatentApplication No. 11-322362 attains a Young's modulus value of 130 orgreater. However, this prior art requires extremely high thermalprocessing temperatures which complicate the manufacturing process, thatis, this art requires a primary processing temperature of 800° C., and asecondary processing temperature of 1,000° C.

SUMMARY OF THE INVENTION

An object of the present invention is to provide an improved glasscomposition.

Another object of the present invention is to provide a glasscomposition having a high Young's modulus and which is highly suited formass production.

These objects are attained with a glass composition of the presentinvention desirably having the main components within the rangesdescribed below:

about 35 wt % or more, but less than about 50 wt % SiO₂;

about 5 wt % or more, but less than about 20 wt % Al₂O₃;

about 9 wt % or more, but less than about 25 wt % MgO;

about 0.1 wt % or more, but less than about 12 wt % TiO₂;

about 0.1 wt % or more, but less than about 12 wt % Li₂O; and

about 0.1 wt % or more, but less than about 22 wt % ZnO.

DESCRIPTION OF THE PREFERRED EMBODIMENT

The preferred embodiments of the present invention are describedhereinafter.

These objects are attained with a glass composition of the presentinvention desirably having the main components within the rangesdescribed below:

about 35 wt % or more, but less than about 50 wt % SiO₂;

about 5 wt % or more, but less than about 20 wt % Al₂O₃;

about 9 wt % or more, but less than about 25 wt % MgO;

about 0.1 wt % or more, but less than about 12 wt % TiO₂;

about 0.1 wt % or more, but less than about 12 wt % Li₂O; and

about 5 wt % or more, but less than about 22 wt % ZnO.

When the composition content of SiO₂ used as a glass forming oxide isless than about 35 wt %, melting characteristics are typically adverselyaffected, and when the percentage exceeds about 50 wt %, a stabilizedstate of glass is achieved and crystal deposition typically becomesdifficult.

Aluminum oxide (Al₂O₃) is an intermediate oxide of glass, and is astructural component of the crystal-phase magnesium-aluminum crystalsformed during heating. When the composition content is less than about 5wt %, there are typically few crystals formed, and the desired strengthis not obtained, whereas when the percentage exceeds about 20 wt %, themelting temperature is typically raised and devitrification readilyoccurs.

Magnesium oxide (MgO) is a fluxing agent, which is added to induce thecrystal particles to nucleate and form crystal particle clusters. Whenthe composition content is less than about 9 wt %, the workingtemperature range is typically narrowed, and the chemical durability ofthe glass matrix phase is not typically improved. When the compositioncontent exceeds about 25 wt %, other crystal phase matter is oftendeposited and the desired strength is typically difficult to obtain.

Titanium oxide (TiO₂) is a crystal nucleating agent, which is often anessential component for magnesium silicate crystal deposition.Furthermore, TiO₂ functions as a fluxing agent to improve stabilityduring production. When the composition content is less than about 0.1wt %, melting characteristics are typically adversely affected, andcrystal growth is often difficult. When the content exceeds about 12 wt%, crystallization typically progresses rapidly, the crystallizationstate often becomes difficult to control, the deposited crystals aretypically coarse with heterogeneity of the crystal phase, and a finehomogeneous crystal structure often cannot be obtained, such that therequired surface smoothness for use as a disk substrate is difficult toobtain by a polishing process. Furthermore, devitrification readilyoccurs during fusion molding, and mass production characteristics arereduced.

Stability during manufacture is improved by the addition of Li₂O, whichfunctions as a fluxing agent. When the composition content is less thanabout 0.1 wt %, there is inadequate improvement in meltingcharacteristics. When the composition content exceeds about 12 wt %,stability often decreases during the polishing and washing processes.

Zinc oxide (ZnO) functions as a fluxing agent which augments uniformcrystal deposition. When the composition content is less than about 5 wt%, there is typically insufficient improvement in crystal homogeneity.When the composition content exceeds about 22 wt %, the glass becomesstable, and crystallization is suppressed, such that the desiredstrength is often difficult to obtain.

The manufacturing method is described below. The raw materials of theultimately produced glass substrate are thoroughly mixed in specificproportions, then introduced to a platinum crucible and melted. Aftermelting, the melted material is poured into a mold to form anapproximate shape. Then the material is annealed to room temperature.Next, the material is maintained at a primary heating processtemperature of about 500 to about 680° C. during a primary process(heating process) to generate crystal nuclei. Then, the material ismaintained at a secondary heating process temperature of about 680 toabout 800° C. during a secondary process to grow crystal nuclei. Thenthe material is cooled to obtain the crystallized glass.

This material may be used as a disk substrate by processing such aspolishing to attain a desired shape and thickness.

By using the above raw materials and the process described herein, anextremely high Young's modulus and high mass production characteristicsare obtainable. Even higher performance is obtained by adding thecomponents described below in a suitable range.

Phosphoric anhydride (P₂O₅), which functions as a fluxing agent, is anucleating agent for depositing silicate crystals, and is an importantcomponent for uniform deposition of crystals on the entirety of theglass. When the composition content is less than about 0.1 wt %,sufficient formation of crystal nuclei typically becomes difficult,crystal particles are often coarse, heterogeneous crystal depositionoften occurs, the desired fine homogeneous crystal structure may bedifficult to obtain, such that the required surface smoothness for useas a disk substrate may be difficult to obtain by a polishing process.When the content exceeds about 5.0 wt %, reactivity to the filter mediumincreases during melting, and devitrification increases so as to reducemass production characteristics during fusion molding. Chemicaldurability typically decreases, there is concern that the magnetic layermay be affected, and stability is often reduced during the polishing andwashing processes.

Adding ZrO₂ which functions as a glass modifying oxidant also functionseffectively as a glass crystal nucleating agent. When the content ratiois less than about 0.1 wt %, sufficient formation of crystal nucleitypically becomes difficult, crystal particles are often coarse,heterogeneous crystal deposition often occurs, the desired finehomogeneous crystal structure may be difficult to obtain, such that therequired surface smoothness for use as a disk substrate may be difficultto obtain by a polishing process. Furthermore, chemical durability andmigration resistance are often reduced, there is concern that themagnetic layer may be affected, and stability is often reduced duringthe polishing and washing processes. When the content exceeds about 12wt %, the melting temperature is raised, devitrification readily occurs,and fusion molding typically becomes difficult. Furthermore, thedeposition crystal phase fluctuates such that desired characteristicsare often difficult to obtain.

The addition of CaO, which functions as a fluxing agent, supplementsuniform crystal deposition. When the composition content is less thanabout 0.1 wt %, sufficient improvement in crystal homogeneity is nottypically obtained. When the content exceeds about 9 wt %, chemicaldurability is not typically improved.

Crystal nucleating material is increased by the addition of Nb₂O₅, whichworks as a fluxing agent. When the composition content is less thanabout 0.1 wt %, there is often inadequate rigidity improvement. When thecomposition content exceeds about 9 wt %, crystallization of the glasstypically becomes unstable, the deposition crystal phase typicallybecomes uncontrollable, and the desired characteristics are oftendifficult to obtain.

The addition of Ta₂O₅, which works as a fluxing agent, improves fusionand strength, and also improves chemical durability in the glass matrixphase. When the composition content is less than about 0.1 wt %, thereis typically inadequate rigidity improvement. When the compositioncontent exceeds about 9 wt %, crystallization of the glass typicallybecomes unstable, the deposition crystal phase becomes uncontrollable,and the desired characteristics are often difficult to obtain.

Stability during manufacture is improved by the addition of K₂O, whichfunctions as a fluxing agent. When the composition content is less thanabout 0.1 wt %, there is inadequate improvement in meltingcharacteristics. When the composition content exceeds about 9 wt %, theglass typically becomes stable and crystallization is suppressed,chemical durability is often reduced, and there is concern that themagnetic layer will be affected, and stability oft en decreases duringthe polishing and washing processes.

Glass phase splitting is promoted by adding B₂O₃, which works as aformer, and accelerates crystal deposition and growth. When thecomposition content is less than about 0.1 wt %, improvement of meltingcharacteristics is typically inadequate. When the composition contentexceeds about 9 wt %, glass devitrification readily occurs, moldingtypically becomes difficult, and the crystals often become coarse suchthat fine crystals is difficult to obtain.

Rigidity is improved by adding Y₂O₃, which functions as a fluxing agent.When the composition content is less than about 0.1 wt %, there istypically inadequate rigidity improvement. When the composition contentexceeds about 9 wt %, crystal deposition is often suppressed, sufficientcrystallization is difficult to obtain, and desired characteristics areoften not attained.

Stability during mass production is improved by adding Sb₂O₃, whichfunctions as a clarifier. When the composition content is less thanabout 0.1 wt %, there is typically insufficient clarification effect,and production characteristics are typically reduced. When thecomposition content exceeds about 9 wt %, crystallization of the glassoften becomes unstable, the deposition crystal phase typically becomesuncontrollable, and the desired characteristics are often difficult toobtain.

Stability during production is improved by adding As₂O₃, which functionsas a clarifier. When the composition content is less than about 0.1 wt%, there is often insufficient clarification effect, and productioncharacteristics are often reduced. When the composition content exceedsabout 9 wt %, crystallization of the glass typically becomes unstable,the deposition crystal phase typically becomes uncontrollable, and thedesired characteristics are often difficult to obtain.

The glasses of the present invention may have one or more crystallinephases and an amorphous phase. The crystalline phases represent about 50to about 60 percent of the total glass composition. Preferredembodiments include a main crystalline phase of clinoenstatite whichdesirably represents at least about 80 percent by weight of the total ofall crystalline phases. Preferred embodiments may also include asecondary crystalline phase of, for example, enstatite magnesiumaluminum silicate, and/or zinc titanium oxide which desirably representsless than about 20 percent by weight of the total crystalline phase.

Although the present invention is described in detail in the followingexamples, the invention is not limited to these examples. Tables 1-4show the glass composition in percent-by-weight of Examples 1-32. Glasssubstrates were obtained by the previously described manufacturingmethod in accordance with these numerical examples.

In the tables, C1 represents a crystal phase of clinoenstatite (MgSiO₃),C2 represents a crystal phase of enstatite (MgSiO₃), M1 represents acrystal phase of magnesium aluminum silicate {(Mg Al)SiO₃}, Z1represents a crystal phase of zinc titanium oxide (Zn₂Ti₃O₈) and Z2represents a crystal phase of zinc titanium oxide (Zn₂TiO₄).

TABLE 1 Ex. 01 Ex. 02 Ex. 03 Ex. 04 Ex. 05 Ex. 06 Ex. 07 Ex. 08 Ex. 09Ex. 10 SiO₂ 48.5 48.0 45.0 45.0 45.0 45.0 40.0 40.0 54.0 44.0 Al₂O 19.018.5 17.5 20.0 10.0 10.0 16.0 16.0 12.0 15.0 MgO 25.0 24.0 20.0 15.519.5 19.5 14.0 12.0 15.5 15.5 TiO₂ 2.0 2.0 5.0 5.0 8.0 5.0 6.0 6.0 5.05.0 Li₂O 0.5 0.5 2.5 2.5 2.5 2.5 4.0 4.0 2.5 2.5 ZnO 5.0 7.0 10.0 12.015.0 18.0 20.0 22.0 10.5 15.0 P₂O₅ 0.5 3.0 Primary Treatment Temperature(° C.) 660 660 660 660 660 660 660 660 660 660 Secondary TreatmentTemperature (° C.) 700 700 700 700 700 700 700 700 700 700 PrimaryTreatment Time (hr) 5 5 5 5 5 5 5 5 5 5 Secondary Treatment Temperature(hr) 5 5 5 5 5 5 5 5 5 5 Young's Modules (G Pa) 110 108 106 104 135 115116 114 113 112 Diameter of Crystal (nm) 30 30 30 30 30 30 30 30 30 30Main Crystal Phase C1 C1 C1 C1 C1 C1 C1 C1 C1 C1 Secondary Crystal PhaseC2 C2 C2 C2 C2 C2 C2 C2 C2 C2 Other Crystal Phase M1 M1 M1 M1 M1 M1 M1M1 M1 M1 Other Crystal Phase Z1 Z1 Z1 Z1 Z1 Z1 Z1 Z1 Z1 Z1 Other CrystalPhase Z2 Z2 Z2 Z2 Z2 Z2 Z2 Z2 Z2 Z2

TABLE 2 Ex. 11 Ex. 12 Ex. 13 Ex. 14 Ex. 15 Ex. 16 Ex. 17 Ex. 18 Ex. 19Ex. 20 SiO₂ 53.0 41.0 53.0 41.0 53.0 42.0 53.0 42.0 55.0 43.0 Al₂O₃ 12.015.0 12.0 15.0 12.0 15.0 12.0 15.0 12.0 15.0 MgO 15.5 15.5 15.5 15.515.5 15.5 15.5 15.5 15.5 15.5 TiO₂ 5.0 5.0 5.0 5.0 5.0 5.0 5.0 5.0 5.05.0 Li₂O 2.5 2.5 2.5 2.5 2.5 2.5 2.5 2.5 2.3 2.5 ZnO 10.0 15.0 10.0 15.010.0 15.0 10.0 15.0 10.0 15.0 ZrO₂ 2.0 6.0 CaO 2.0 6.0 Nb₂O₅ 2.0 5.0Ta₂O₅ 2.0 5.0 K₂O 0.2 4.0 Primary Treatment Temperature (° C.) 660 660660 660 660 660 660 660 660 660 Secondary Treatment Temperature (° C.)700 700 700 700 700 700 700 700 700 700 Primary Treatment Time (hr) 5 55 5 5 5 5 5 5 5 Secondary Treatment Temperature (hr) 5 5 5 5 5 5 5 5 5 5Young's Modules (G Pa) 117 115 117 116 116 115 116 115 115 114 Diameterof Crystal (nm) 30 30 30 30 30 30 30 30 30 30 Main Crystal Phase C1 C1C1 C1 C1 C1 C1 C1 C1 C1 Secondary Crystal Phase C2 C2 C2 C2 C2 C2 C2 C2C2 C2 Other Crystal Phase M1 M1 M1 M1 M1 M1 M1 M1 M1 M1 Other CrystalPhase Z1 Z1 Z1 Z1 Z1 Z1 Z1 Z1 Z1 Z1 Other Crystal Phase Z2 Z2 Z2 Z2 Z2Z2 Z2 Z2 Z2 Z2

TABLE 3 Ex. 21 Ex. 22 Ex. 23 Ex. 24 Ex. 25 Ex. 26 Ex. 27 Ex. 28 Ex. 29Ex. 30 SiO₂ 53.0 41.0 53.0 53.0 53.0 51.0 51.0 43.0 42.0 35.0 Al₂O₃ 12.015.0 12.0 15.0 12.0 15.0 12.0 15.0 12.0 14.0 MgO 15.5 15.5 15.5 15.520.0 15.5 15.5 15.5 15.5 15.5 TiO₂ 5.0 5.0 5.0 5.0 5.0 5.0 5.0 5.0 5.05.0 Li₂O 2.5 2.5 2.5 2.5 2.8 3.0 2.5 2.5 2.5 2.5 ZnO 10.0 15.0 10.0 5.07.0 10.0 12.0 15.0 18.0 20.0 B₂O₃ 2.0 6.0 Y₂O₃ 2.0 4.0 Sb₂O₃ 0.2 0.5 2.04.0 5.0 8.0 Primary Treatment Temperature (° C.) 660 660 660 660 660 660660 660 660 660 Secondary Treatment Temperature (° C.) 700 700 700 700700 700 700 700 700 700 Primary Treatment Time (hr) 5 5 5 5 5 5 5 5 5 5Secondary Treatment Temperature (hr) 5 5 5 5 5 5 5 5 5 5 Young's Modules(G Pa) 114 116 115 116 120 117 115 115 116 117 Diameter of Crystal (nm)30 30 30 30 30 30 30 30 30 30 Main Crystal Phase C1 C1 C1 C1 C1 C1 C1 C1C1 C1 Secondary Crystal Phase C2 C2 C2 C2 C2 C2 C2 C2 C2 C2 OtherCrystal Phase M1 M1 M1 M1 M1 M1 M1 M1 M1 M1 Other Crystal Phase Z1 Z1 Z1Z1 Z1 Z1 Z1 Z1 Z1 Z1 Other Crystal Phase Z2 Z2 Z2 Z2 Z2 Z2 Z2 Z2 Z2 Z2

TABLE 4 Ex. 31 Ex. 32 SiO₂ 41.0 42.0 Al₂O₃ 12.0 15.0 MgO 15.5 15.5 TiO₂5.0 5.0 Li₂O 2.5 2.5 ZnO 22.0 15.0 As₂O₃ 2.0 5.0 Primary TreatmentTemperature (° C.) 660 660 Secondary Treatment Temperature (° C.) 700700 Primary Treatment Time (hr) 5 5 Secondary Treatment Temperature (hr)5 5 Young's Modules (G Pa) 115 117 Diameter of Crystal (nm) 30 30 MainCrystal Phase C1 C1 Secondary Crystal Phase C2 C2 Other Crystal Phase M1M1 Other Crystal Phase Z1 Z1 Other Crystal Phase Z2 Z2

The present invention provides a glass substrate having excellentproduction characteristics and a Young's modulus of 110 or higher.

Although the present invention has been fully described by way ofexamples with reference to the accompanying drawings, it is to be notedthat various changes and modification will be apparent to those skilledin the art. Therefore, unless such changes and modifications depart fromthe scope of the present invention, they should be construed as beingincluded therein.

What is claimed is:
 1. A polished glass ceramic disk medium substratecomprising crystalline and amorphous phases formed of a mixture of glassforming raw materials comprising about 35% to about 50% by weight ofSiO₂; about 5% to about 20% by weight of Al₂O₃; about 9% to about 25% byweight of MgO; about 0.1% to about 12% by weight of TiO₂; about 0.1% toabout 12% by weight of Li₂O; and about 5% to about 22% by weight ZnO;wherein said glass disk medium substrate includes one or morecrystalline phases selected from clinoenstatite, magnesium aluminumsilicate, Zn₂Ti₃O₈, Zn₂TiO₄, or a main crystalline phase ofclinoenstatite and a secondary crystalline phase of enstatite.
 2. Thepolished glass ceramic disk medium substrate according to claim 1,wherein the raw materials further comprise about 0.1% to about 5% byweight P₂O₅.
 3. The polished glass ceramic disk medium substrateaccording to claim 1, wherein the raw materials further comprise about0.1% to about 12% by weight ZrO₂.
 4. The polished glass ceramic diskmedium substrate according to claim 1, wherein the raw materials furthercomprise about 0.1% to about 9% by weight CaO.
 5. The polished glassceramic disk medium substrate according to claim 1, wherein the rawmaterials further comprise about 0.1% to about 9% by weight Nb₂O₅. 6.The polished glass ceramic disk medium substrate according to claim 1,wherein the raw materials further comprise about 0.1% to about 9% byweight Ta₂O₅.
 7. The polished glass ceramic disk medium substrateaccording to claim 1, wherein the raw materials further comprise about0.1% to about 9% by weight K₂O.
 8. The polished glass ceramic diskmedium substrate according to claim 1, wherein the raw materials furthercomprise about 0.1% to about 9% by weight B₂O₃.
 9. The polished glassceramic disk medium substrate according to claim 1, wherein the rawmaterials further comprise about 0.1% to about 9% by weight Y₂O₃. 10.The polished glass ceramic disk medium substrate according to claim 1,wherein the raw materials further comprise about 0.1% to about 9% byweight Sb₂O₃.
 11. The polished glass ceramic disk medium substrateaccording to claim 1, wherein the raw materials further comprise about0.1% to about 9% by weight As₂O₃.
 12. The polished glass ceramic diskmedium substrate according to claim 1, said raw materials consistingessentially of about 35% to about 50% by weight SiO₂; about 5% to about20% by weight Al₂O₃; about 9% to about 25% by weight MgO; about 0.1% toabout 12% by weight TiO₂; about 0.1% to about 12% by weight Li₂O; andabout 5% to about 22% by weight ZnO.
 13. The polished glass ceramic diskmedium substrate according to claim 12, further containing one or moreof the following: about 0.1% to about 5% by weight P₂O₅; about 0.1% toabout 12% by weight ZrO₂; about 0.1% to about 9% by weight CaO; about0.1% to about 9% by weight Nb₂O₅; about 0.1% to about 9% by weightTa₂O₅; about 0.1% to about 9% by weight K₂O; about 0.1% to about 9% byweight B₂O₃; about 0.1% to about 9% by weight Y₂O₃; about 0.1% to about9% by weight Sb₂O₃; and about 0.1% to about 9% by weight As₂O₃.
 14. Thepolished glass ceramic disk medium substrate according to claim 12,wherein said substrate is essentially free of BaO, ZrO₂, B₂O₃ and NiO.15. The polished glass ceramic disk medium substrate according to claim1, wherein the crystalline phases represent about 50 to about 60 percentby weight of the total glass composition.
 16. The polished glass ceramicdisk medium substrate according to claim 1, comprising a crystallinephase of clinoenstatite.
 17. The polished glass ceramic disk mediumsubstrate according to claim 16, wherein the crystalline phase ofclinoenstatite represents at least about 80 percent by weight of thecrystalline phases.
 18. The polished glass ceramic disk medium substrateaccording to claim 1, comprising a crystalline phase of enstatite. 19.The polished glass ceramic disk medium substrate according to claim 18,wherein the crystalline phase of enstatite represents less than or equalto about 20 percent by weight of the crystalline phases.
 20. Thepolished glass ceramic disk medium substrate according to claim 1,comprising a crystalline phase of magnesium aluminum silicate.
 21. Thepolished glass ceramic disk medium substrate according to claim 20,wherein the crystalline phase of magnesium aluminum silicate representsless than or equal to about 20 percent by weight of the crystallinephases.
 22. The polished glass ceramic disk medium substrate accordingto claim 1, comprising a crystalline phase of Zn₂Ti₃O₈.
 23. The polishedglass ceramic disk medium substrate according to claim 22, wherein thecrystalline phase of Zn₂Ti₃O₈ represents less than or equal to about 20percent by weight of the crystalline phases.
 24. The polished glass diskmedium substrate according to claim 1, comprising a crystalline phase ofZn₂TiO₄.
 25. The polished glass ceramic disk medium substrate accordingto claim 24, wherein the crystalline phase of Zn₂TiO₄ represents lessthan or equal to about 20 percent by weight of the crystalline phase.26. The polished glass ceramic disk medium substrate according to claim1, comprising a main crystalline phase of clinoenstatite and a secondarycrystalline phase of enstatite.
 27. The polished glass ceramic diskmedium substrate according to claim 26, further comprising one or moreof a crystalline phase of magnesium aluminum silicate, a crystallinephase of Zn₂TiO₄.
 28. The polished glass ceramic disk medium substrateaccording to claim 1, wherein said glass disk medium substrate has aYoung's modulus of 110 GPa or higher.
 29. The polished glass ceramicdisk medium substrate according to claim 1, wherein said substrate isprepared by heating glass forming raw materials to a temperature, T₁,between about 500 and 680° C. to generate crystal nuclei; heating at atemperature, T₂, between about 680 and about 800° C. to grow crystalnuclei; and cooling to obtain crystallized glass.
 30. A recording diskcomprising the polished glass ceramic disk medium substrate defined inclaim
 1. 31. The recording disk according to claim 30, wherein saidrecording disk is a hard disk.
 32. The recording disk according to claim30, wherein said recording disk is a magnetic disk.
 33. The recordingdisk according to claim 30, wherein said recording disk is an opticaldisk.
 34. The recording disk according to claim 30, wherein saidrecording disk is a magnetic-optical disk.
 35. A method of making aglass ceramic disk medium substrate comprising: heating glass formingraw materials to a temperature sufficiently high to melt the rawmaterials; forming a disk medium substrate; and crystallizing the diskmedium substrate, wherein said crystallizing comprises heating the diskmedium substrate to a temperature, T₁, between about 500 and 680° C. togenerate crystal nuclei; heating at a temperature, T₂, between about 680and about 800° C. to grow crystal nuclei; and cooling to obtaincrystallized glass; wherein said glass disk medium substrate is formedof a mixture of glass forming raw materials comprising, about 35% toabout 50% by weight of SiO₂; about 5% to about 20% by weight of Al₂O₃;about 9% to about 25% by weight of MgO; about 0.1% to about 12% byweight of TiO₂; about 0.1% to about 12% by weight of Li₂O; and about 5%to about 22% by weight ZnO.
 36. The method according to claim 35,further comprising polishing said glass ceramic disk medium substrate.37. The method according to claim 35, wherein said glass ceramic diskmedium substrate has a Young's modulus of 110 GPa or higher.